Monolayer Graphene on SiO₂/Si 300 nm
![Monolayer Graphene on SiO₂/Si 300 nm](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297642991-LUHZS3Q8JO5PEZZ73WHG/MGSiO2.png)
![MGSiO2.6.png](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297748052-ETZWA0QHSSSZYQ350A4P/MGSiO2.6.png)
![MGSiO2.5.png](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297729772-HKTBEL65GTS5MUSWMM9N/MGSiO2.5.png)
![MGSiO2.1.png](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297667560-NJ9AE9IIG1UZNSF7QJUD/MGSiO2.1.png)
![MGSiO2.2.png](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297692827-6F5OR2ZME948WYZ4SLM5/MGSiO2.2.png)
![MGSiO2.3.png](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297703937-XGRZYHWKD3EZOF2AXS9Z/MGSiO2.3.png)
![MGSiO2.4.png](https://images.squarespace-cdn.com/content/v1/5a80c6c30100274e1902dffd/1567297716327-3IWAJP76YKLNUUGXX66G/MGSiO2.4.png)
Monolayer Graphene on SiO₂/Si 300 nm
from $50.00
Monolayer Graphene on SiO₂/Si - Fully Covered - Processed in Clean Room Class 1000
This monolayer graphene on SiO₂/Si (fully covered) is a bidimensional material produced by CVD and transferred to a circular substrate of SiO₂/Si (300nm) by a wet transfer process. We consider it to be a benchmark product in the graphene market - not only for its excellent quality, but also for its shape, size and number of applications.
Graphene Film
Growth method: CVD synthesis
Appearance (color): Transparent
Transparency: > 97%
Coverage: > 95%
Number of graphene layers: 1
Thickness (theoretical): 0.345 nm
FET Electron Mobility on Al2O3 passivated SiO2/Si: 6900 cm2
FET Electron Mobility on SiO₂/Si: 3760 cm2
Sheet Resistance on SiO₂/Si: 450±40 Ohms/sq (1cm x1cm)
Grain size: Up to 20 μm
Substrate SiO₂/SI
Dry Oxide Thickness: 300 nm (+/-5%)
Type/Dopant: P/Bor
Orientation: <100>
Resistivity: 1-10 ohm·cm
Thickness: 525 +/- 20 μm
Front surface: Single Side Polished
Back Surface: Etched
Particles: <10@0.3 μm
Quality Control
All our samples are subjected to a rigorous QC in order to ensure a high quality and reproducibility of the graphene. All our CVD materials are processed in Clean Room Class 1000. Each batch must pass the following tests:
Raman Spectroscopy on each batch: I(G)/I(2D)<0.7; I(D)/I(G)<0.05
Optical Microscopy inspection of each individual sample to ensure good transfer quality and purity
If your application requires more specific controls (AFM, SEM...) please do not hesitate to contact us.
Size:
Quantity: